Tokyo Electron Limited (OTCMKTS:TOELY) Sees Significant Drop in Short Interest

Tokyo Electron Limited (OTCMKTS:TOELYGet Free Report) saw a large decline in short interest in the month of October. As of October 15th, there was short interest totalling 49,100 shares, a decline of 82.9% from the September 30th total of 286,500 shares. Based on an average daily trading volume, of 250,700 shares, the days-to-cover ratio is presently 0.2 days.

Wall Street Analyst Weigh In

Separately, Sanford C. Bernstein raised shares of Tokyo Electron to a “strong-buy” rating in a research note on Monday, October 7th.

Check Out Our Latest Research Report on TOELY

Tokyo Electron Trading Up 0.7 %

Shares of TOELY stock traded up $0.54 on Friday, hitting $77.25. The stock had a trading volume of 141,036 shares, compared to its average volume of 175,051. Tokyo Electron has a twelve month low of $64.30 and a twelve month high of $134.91. The company has a fifty day moving average price of $85.02 and a two-hundred day moving average price of $100.52. The firm has a market cap of $143.07 billion, a P/E ratio of 28.82 and a beta of 1.50.

Tokyo Electron (OTCMKTS:TOELYGet Free Report) last posted its earnings results on Thursday, August 8th. The company reported $0.87 earnings per share for the quarter. Tokyo Electron had a return on equity of 24.79% and a net margin of 21.32%. The firm had revenue of $3.56 billion for the quarter, compared to analyst estimates of $3.12 billion. On average, analysts expect that Tokyo Electron will post 3.23 earnings per share for the current year.

Tokyo Electron Company Profile

(Get Free Report)

Tokyo Electron Limited, together with its subsidiaries, develops, manufactures, and sells semiconductor and flat panel display (FPD) production equipment in Japan, Europe, North America, Taiwan, China, South Korea, Southeast Asia, and internationally. The company offers coaters/developers, etch systems, surface preparation systems, deposition systems, test systems, wafer bonders/debonders, wafer edge trimming, SiC epitaxial CVD systems, gas cluster ion beam system, and cleaning systems.

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